The Blaze "Torch" lithography-aware analysis and optimization technology enables chip designers to model and compensate for litho-induced process variations when working with silicon technologies of 65nm and below. Blaze Torch technology employs the production-OPC "Halo" lithography simulation engine to model the effects of process variations on power and performance. It uses built-in timing and power optimization algorithms to automatically compensate for these variations. It also identifies litho hot-spots that could lead to physical defects, and produces a repair guidance file for automatic defect repair using third-party physical design tools.