Blaze DFM provides software solutions to fabless semiconductor companies, integrated device manufacturers, and silicon foundries. Blaze products give IC designers greater control over manufacturing variability, improving yield and shortening time to volume production.
The Blaze "Torch" lithography-aware analysis and optimization technology enables chip designers to model and compensate for litho-induced process variations when working with silicon technologies of 65nm and below. Blaze Torch technology employs the production-OPC "Halo" lithography simulation engine to model the effects of process variations on power and performance. It uses built-in timing and power optimization algorithms to automatically compensate for these variations. It also identifies litho hot-spots that could lead to physical defects, and produces a repair guidance file for automatic defect repair using third-party physical design tools.
